[NanoIC topic] Topological protected textures stabilized by advanced patterning

Topological protected textures stabilized by advanced patterning

Shape the future of low‑power computing by advancing magnetic skyrmions from concept to technology using advanced patterning techniques. Magnetic skyrmions are nanoscale, topologically protected spin structures that are expected to remain stable even in the presence of defects and thermal noise. Their tiny size and ability to move with extremely low electric currents make them promising candidates for high‑dense, energy‑efficient data storage and racetrack‑style memory devices. They are being explored for low‑power information‑processing technologies such as spintronic logic, neuromorphic computing, and quantum computing. Although this holds promising abilities for future technologies, several challenges must be overcome before introducing the magnetic bit into real devices. Stabilization is a primary issue for development. At imec, we aim to solve this issue based on advanced patterning technology thanks to our state‑of‑the‑art infrastructure and long‑term experiments in nanofabrication. The offered internship positions you at the center of the challenges to bring magnetic skyrmions into applications.

Type of internship: Master internship

Duration: 6–12 months

Required educational background: Physics, Materials Engineering, Nanoscience & Nanotechnology

Reference code: 2026-INT-139. Mention this reference code in your application.

Supervising scientists: Van Tuong Pham and John Petersen

Imec allowance will be provided for students studying at a non‑Belgian university.

Applications

Please include the following information in your application:

• Resume
• Motivation
• Current study

Incomplete applications will not be considered.

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