High-speed UV Nanopatterning for Metasurfaces and Optical Device Fabrication
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/ High-speed UV Nanopatterning for Metasurfaces and Optical Device Fabrication
High-speed UV Nanopatterning for Metasurfaces and Optical Device Fabrication
Master internship, PhD internship - Leuven | More than two weeks ago
Explore state-of-the-art nanotechnology in optical design and nanopatterning
We focus on the development of nanopatterning processes for electronic device applications using innovative lithographic methods. Multilayer patterning based on advanced optical principles is of particular interest for achieving high-speed, large-area nanofabrication. This work aims to understand material characterization during the lithographic process and the associated light–matter interactions. Process optimization is an integral part of the topic to ensure high-quality pattern formation on samples. During the training period, hands-on experience in lithography as well as metrology for optical characterization will be acquired.
Type of internship: Master internship, PhD internship
Required educational background: Bioscience Engineering, Materials Engineering, Mechanical Engineering, Nanoscience & Nanotechnology, Physics
Supervising scientist(s): For further information or for application, please contact Hyun-su Kim (Hyun-su.Kim@imec.be )
The reference code for this position is 2026-INT-079. Mention this reference code in your application.
Only for self-supporting students.
Responsibilities:
- Prepare samples and receive training in lithographic patterning processes.
- Perform optical simulations for lithography.
- Support the design and fabrication of metasurfaces.
- Document experimental results and contribute to reports and presentations.
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