Design-aware nanophotonic substrates for surface-enhanced, ultrafast spectroscopy of EUV photoresists

/ Design-aware nanophotonic substrates for surface-enhanced, ultrafast spectroscopy of EUV photoresists

Design-aware nanophotonic substrates for surface-enhanced, ultrafast spectroscopy of EUV photoresists

Enhance ultrafast spectroscopy to the nanoscale limit via nanoengineered substrates

Extreme ultraviolet (EUV) lithography serves as the bedrock patterningtechnology that produces the world’s most advanced nanoelectronic structures anddevices. While EUV lithography is already adopted in high-volume manufacturing ofadvanced chips, the underlying physical and chemical mechanisms of how EUVphotons transform light-sensitive materials (photoresists) into nanoscalecircuitry patterns remain elusive. The mysteries of EUV reaction mechanisms innanometer-scale thin films have their origins in the highly energetic andcomplex reaction landscape of EUV lithography, which involves (among others)ionization, formation of transient species, electron interactions, and chemicalreactions. Resolving this complex reaction landscape within the confined volumeof nanometer-scale films and with a time-resolution to “see” the transformationin real time is a scientific grand challenge.

In imec’s AttoLab, we are tackling this grandchallenge by developing femtosecond time-resolved spectroscopy to track EUVphotoresist dynamics in real-time. However, the limited interaction volume ofat-scale EUV photoresists (<30 nm thickness) severely degrades the signal-to-noiseratio (SNR) and prevents detection of key molecular events occuring during theexposure process. In this project, you will help to tackle the SNR challenge byexploiting the benefits of localized surface plasmon resonances (LSPR’s) ofnanostructured arrays to enhance spectroscopic signals (i.e., surface-enhanced infraredabsorption spectroscopy, SEIRA). Working closely with imec experts inlithography, materials chemistry, and ultrafast optical science, you willdesign and simulate nanostructured arrays that support LSPR’s to boost IRsignals at key reactive modes for EUV photoresists. The design and simulationswill be performed using finite element or finite-difference time-domain methods,which take into account realistic material properties and CMOS compatibility. Youwill then translate the simulation design and results into a real-world processflow that will be used to produce the substrates. Time permitting, you willalso have the opportunity to characterize the designed and produced substratesusing a suite of microscopies (e.g., AFM, SEM, etc.) and spectroscopies (e.g,FTIR).

Type of internship: Master internship

Duration: 3 to 6 months

Required educational background: Chemistry/Chemical Engineering, Materials Engineering, Physics, Nanoscience & Nanotechnology

University promotor: Pol Van Dorpe (KU Leuven)

The reference code for this position is 2026-INT-345. Mention this reference code in your application.

Imec allowance will be provided for students studying at a non-Belgian university.

Who youare:

• Motivated student with apassion for (nano)optics, data analysis, and advanced simulations
• In-progress Masters’s degree inchemistry, physics, material science, nanoscience (or comparable)
• Solid background on finiteelement or finite difference time domain modelling approaches, spectroscopy,and/or nano-optical components
• Proficiencyin data analysis and coding (Python, Matlab, etc.) is highly valued
• Good written and verbal Englishskills

Typeof work:

10% data analysis, 80%modeling/simulation, 10% literature

Supervising scientist(s): For further information or for application, please contact James Rupert ( James.Rupert@imec.be ) and Kevin Dorney ( Kevin.Dorney@imec.be )

The reference code for this position is 2026-INT-345. Mention this reference code in your application.

Imec allowance will be provided for students studying at a non-Belgian university.